| Uniformity Coefficient | 1.2 |
|---|---|
| Water Retention Capacity | 54 - 60% |
| Total Exchange Capacity (eq/L) | 1.1 |
| Resin Type | SBA I |
| Particle Diameter (um) | 630 ± 50 |
| Ion Form | OH |
| Matrix (Styrenic/Acrylic) | Styrenic |
| Matrix (Gel/Macro) | Gel |
| Application | Boron Removal, Mixed Bed Polishing, Primary Mixed Beds, Ultrapure Water |
AmberTec™ UP4000 OH
In stock
Only %1 left
SKU
DWNA-AMBERTECUP4000OH
$5,337.00
$99,999.99
- AmberTec™ UP4000 OH Ion Exchange Resin is a semiconductor-grade, uniform particle size, gel, strong base anion resin developed specifically for use in producing ultrapure water for the semiconductor industry It is intended for use in regenerable primary or polishing mixed beds, and it is sold in the fully-regenerated hydroxide form to ensure minimum impurity leakage. AmberTec™ UP4000 OH is designed to be paired with cationic AmberTec™ UP1400 H Ion Exchange Resin for mixed bed applications. Its high exchange capacity makes AmberTec™ UP4000 OH the product of choice for the removal of trace boron postreverse osmosis in single beds regenerated with NaOH. AmberTec™ UP4000 OH can also be used as the anion exchange resin component of a non-regenerable polishing mixed bed to achieve the lowest possible leakage of ionic species, silica, total organic carbon (TOC), and submicron particles.